Ultrafine multilayers of complex metal oxide films

Terry G. Holesinger; Quanxi Jia; Boris Maiorov; Leonardo Civale; Paul C. Dowden; Brady J. Gibbons

doi:10.1002/adma.200602743

Ultrafine multilayers of complex metal oxide films

Terry G. Holesinger
, Quanxi Jia
, Boris Maiorov
, Leonardo Civale
, Paul C. Dowden
, Brady J. Gibbons

Department of Materials Design and Innovation

Los Alamos National Laboratory
Oregon State University

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

Complex metal oxide Y123/Eu123 multilayer films ranging in thickness from 0.8 to 1.8 μm and with periodicities of less than 20 nm were grown on single-crystal substrates and flexible biaxially textured templates. Transmission electron microscopy (TEM) and scanning TEM (STEM) analysis shows that multilayer structure is uniformly present from top to bottom with almost no secondary phases such as inclusions found in monolithic films and the multilayer films. The presence of many antiphase boundaries (APBs) are found near the interface with underlying buffer layers, around precipitates, and stacking faults within the films. Short periodicities of the multilayer structures suppress the formation of secondary phases in favor of forming stacking faults through the insertion of extra metal oxide layer, to compensate for local compositional variations during multilayer film growth.

Original language	English
Pages (from-to)	1917-1920
Number of pages	4
Journal	Advanced Materials
Volume	19
Issue number	15
DOIs	https://doi.org/10.1002/adma.200602743
State	Published - Aug 3 2007

Access to Document

10.1002/adma.200602743

Cite this

@article{7774d88182b84e708efc13afd77dca57,

title = "Ultrafine multilayers of complex metal oxide films",

abstract = "Complex metal oxide Y123/Eu123 multilayer films ranging in thickness from 0.8 to 1.8 μm and with periodicities of less than 20 nm were grown on single-crystal substrates and flexible biaxially textured templates. Transmission electron microscopy (TEM) and scanning TEM (STEM) analysis shows that multilayer structure is uniformly present from top to bottom with almost no secondary phases such as inclusions found in monolithic films and the multilayer films. The presence of many antiphase boundaries (APBs) are found near the interface with underlying buffer layers, around precipitates, and stacking faults within the films. Short periodicities of the multilayer structures suppress the formation of secondary phases in favor of forming stacking faults through the insertion of extra metal oxide layer, to compensate for local compositional variations during multilayer film growth.",

author = "Holesinger, \{Terry G.\} and Quanxi Jia and Boris Maiorov and Leonardo Civale and Dowden, \{Paul C.\} and Gibbons, \{Brady J.\}",

year = "2007",

month = aug,

day = "3",

doi = "10.1002/adma.200602743",

language = "English",

volume = "19",

pages = "1917--1920",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "15",

}

TY - JOUR

T1 - Ultrafine multilayers of complex metal oxide films

AU - Holesinger, Terry G.

AU - Jia, Quanxi

AU - Maiorov, Boris

AU - Civale, Leonardo

AU - Dowden, Paul C.

AU - Gibbons, Brady J.

PY - 2007/8/3

Y1 - 2007/8/3

N2 - Complex metal oxide Y123/Eu123 multilayer films ranging in thickness from 0.8 to 1.8 μm and with periodicities of less than 20 nm were grown on single-crystal substrates and flexible biaxially textured templates. Transmission electron microscopy (TEM) and scanning TEM (STEM) analysis shows that multilayer structure is uniformly present from top to bottom with almost no secondary phases such as inclusions found in monolithic films and the multilayer films. The presence of many antiphase boundaries (APBs) are found near the interface with underlying buffer layers, around precipitates, and stacking faults within the films. Short periodicities of the multilayer structures suppress the formation of secondary phases in favor of forming stacking faults through the insertion of extra metal oxide layer, to compensate for local compositional variations during multilayer film growth.

AB - Complex metal oxide Y123/Eu123 multilayer films ranging in thickness from 0.8 to 1.8 μm and with periodicities of less than 20 nm were grown on single-crystal substrates and flexible biaxially textured templates. Transmission electron microscopy (TEM) and scanning TEM (STEM) analysis shows that multilayer structure is uniformly present from top to bottom with almost no secondary phases such as inclusions found in monolithic films and the multilayer films. The presence of many antiphase boundaries (APBs) are found near the interface with underlying buffer layers, around precipitates, and stacking faults within the films. Short periodicities of the multilayer structures suppress the formation of secondary phases in favor of forming stacking faults through the insertion of extra metal oxide layer, to compensate for local compositional variations during multilayer film growth.

UR - https://www.scopus.com/pages/publications/34547765539

U2 - 10.1002/adma.200602743

DO - 10.1002/adma.200602743

M3 - Article

AN - SCOPUS:34547765539

SN - 0935-9648

VL - 19

SP - 1917

EP - 1920

JO - Advanced Materials

JF - Advanced Materials

IS - 15

ER -

Ultrafine multilayers of complex metal oxide films

Abstract

Access to Document

Other files and links

Fingerprint

Cite this