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Ultra-Fast Non-Volatile Resistive Switching Devices with Over 512 Distinct and Stable Levels for Memory and Neuromorphic Computing

  • Ming Xiao
  • , Markus Hellenbrand
  • , Nives Strkalj
  • , Babak Bakhit
  • , Zhuotong Sun
  • , Nikolaos Barmpatsalos
  • , Dovydas Joksas
  • , Hongyi Dou
  • , Zedong Hu
  • , Ping Lu
  • , Samip Karki
  • , Sundar Kunwar
  • , Jonathan D. Major
  • , Aiping Chen
  • , Haiyan Wang
  • , Quanxi Jia
  • , Adnan Mehonic
  • , Judith L. MacManus-Driscoll
  • University of Cambridge
  • Sun Yat-Sen University
  • Institute of Physics Zagreb
  • Linköping University
  • University College London
  • Purdue University
  • Sandia National Laboratories, New Mexico
  • United States Department of Energy
  • University of Liverpool

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

Low-current multilevel programmability with inherent non-volatility and high stability of resistance states is required for both multi-bit memory storage and deep learning accelerators but is difficult to achieve. Here, in a resistive switching system, this work realizes >512 (>9 bits) distinct non-volatile conductance levels with stable retention for each state with current levels down to the nanoampere range, highly promising for potential integration with small processing nodes with ultra-low power consumption requirements. This is achieved by demonstrating a new thin film design concept that encompasses three key features: an ultra-thin epitaxial oxygen ionic switching layer that provides a tunable energy barrier at the bottom electrode, an overcoat amorphous layer that acts as an ion migration barrier for stable state retention, and a partial conductive filament as a localized electronic transport channel to the epitaxial switching layer. A large dynamic resistance range of up to seven orders of magnitude is achieved with reset-free transitions among intermediate states, and programmability is demonstrated with ultra-fast (20 ns) pulses. Artificial neural network (ANN) simulations, based on the experimental performance and its non-idealities, demonstrate close-to-ideal inference accuracies for various Modified National Institute of Standards and Technology (MNIST) data sets.

Original languageEnglish
Article number2418980
JournalAdvanced Functional Materials
Volume35
Issue number29
DOIs
StatePublished - Jul 17 2025

Keywords

  • artificial neural network
  • epitaxial and amorphous film deposition
  • memristive
  • multilevel resistive switching
  • non-volatility

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