Theory of Adsorption Processes at Ring-Disk Electrodes. Application to the Adsorption of Copper(I) in 0.5 M Hydrochloric Acid on Platinum

Stanley Bruckenstein; D. T. Napp; Stanley Bruckenstein

doi:10.1021/ja01025a009

Theory of Adsorption Processes at Ring-Disk Electrodes. Application to the Adsorption of Copper(I) in 0.5 M Hydrochloric Acid on Platinum

Stanley Bruckenstein
, D. T. Napp
, Stanley Bruckenstein

Chemistry

University of Minnesota Twin Cities
SUNY Buffalo

Research output: Contribution to journal › Article › peer-review

34 Scopus citations

Abstract

The theoretical background necessary for the application of the rotating ring-disk electrode to the study adsorption processes at solid electrodes is presented. A study was made of the Cu(I)-Cu(II) system in 0.5 M HCl at a platinum rotating ring-disk electrode. The shapes of the curves for the disk current and ring current us. time and potential were in excellent agreement with the theoretical predictions. At 0.0 V, 0.15 mC/cm² of Cu(I) is adsorbed on platinum for Cu(I) concentrations ranging from 10^-6 to 2 X 10^-3 M.

Original language	English
Pages (from-to)	6303-6309
Number of pages	7
Journal	Journal of the American Chemical Society
Volume	90
Issue number	23
DOIs	https://doi.org/10.1021/ja01025a009
State	Published - Nov 1968

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10.1021/ja01025a009

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title = "Theory of Adsorption Processes at Ring-Disk Electrodes. Application to the Adsorption of Copper(I) in 0.5 M Hydrochloric Acid on Platinum",

abstract = "The theoretical background necessary for the application of the rotating ring-disk electrode to the study adsorption processes at solid electrodes is presented. A study was made of the Cu(I)-Cu(II) system in 0.5 M HCl at a platinum rotating ring-disk electrode. The shapes of the curves for the disk current and ring current us. time and potential were in excellent agreement with the theoretical predictions. At 0.0 V, 0.15 mC/cm2 of Cu(I) is adsorbed on platinum for Cu(I) concentrations ranging from 10-6 to 2 X 10-3 M.",

author = "Stanley Bruckenstein and Napp, \{D. T.\} and Stanley Bruckenstein",

year = "1968",

month = nov,

doi = "10.1021/ja01025a009",

language = "English",

volume = "90",

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journal = "Journal of the American Chemical Society",

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T1 - Theory of Adsorption Processes at Ring-Disk Electrodes. Application to the Adsorption of Copper(I) in 0.5 M Hydrochloric Acid on Platinum

AU - Bruckenstein, Stanley

AU - Napp, D. T.

AU - Bruckenstein, Stanley

PY - 1968/11

Y1 - 1968/11

N2 - The theoretical background necessary for the application of the rotating ring-disk electrode to the study adsorption processes at solid electrodes is presented. A study was made of the Cu(I)-Cu(II) system in 0.5 M HCl at a platinum rotating ring-disk electrode. The shapes of the curves for the disk current and ring current us. time and potential were in excellent agreement with the theoretical predictions. At 0.0 V, 0.15 mC/cm2 of Cu(I) is adsorbed on platinum for Cu(I) concentrations ranging from 10-6 to 2 X 10-3 M.

AB - The theoretical background necessary for the application of the rotating ring-disk electrode to the study adsorption processes at solid electrodes is presented. A study was made of the Cu(I)-Cu(II) system in 0.5 M HCl at a platinum rotating ring-disk electrode. The shapes of the curves for the disk current and ring current us. time and potential were in excellent agreement with the theoretical predictions. At 0.0 V, 0.15 mC/cm2 of Cu(I) is adsorbed on platinum for Cu(I) concentrations ranging from 10-6 to 2 X 10-3 M.

UR - https://www.scopus.com/pages/publications/33947311111

U2 - 10.1021/ja01025a009

DO - 10.1021/ja01025a009

M3 - Article

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SN - 0002-7863

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JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

IS - 23

ER -

Theory of Adsorption Processes at Ring-Disk Electrodes. Application to the Adsorption of Copper(I) in 0.5 M Hydrochloric Acid on Platinum

Abstract

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