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Temperature-dependent leakage mechanisms of PtBiFe O3 SrRu O3 thin film capacitors

  • H. Yang
  • , M. Jain
  • , N. A. Suvorova
  • , H. Zhou
  • , H. M. Luo
  • , D. M. Feldmann
  • , P. C. Dowden
  • , R. F. Depaula
  • , S. R. Foltyn
  • , Q. X. Jia
  • Los Alamos National Laboratory

Research output: Contribution to journalArticlepeer-review

213 Scopus citations

Abstract

Epitaxial c -axis oriented BiFe O3 (BFO) thin films were deposited on conductive SrRu O3 (SRO) on (001) SrTi O3 substrates by pulsed laser deposition. A Pt/BFO/SRO capacitor was constructed by depositing a top Pt electrode. The leakage current density versus. electric field characteristics were investigated from 80 to 350 K. It was found that the leakage mechanisms were a strong function of temperature and voltage polarity. At temperatures between 80 and 150 K, space-charge-limited current was the dominant leakage mechanism for both negative and positive biases. On the other hand, at temperatures between 200 and 350 K the dominant leakage mechanisms were Poole-Frenkle emission and Fowler-Nordheim tunneling for negative and positive biases, respectively.

Original languageEnglish
Article number072911
JournalApplied Physics Letters
Volume91
Issue number7
DOIs
StatePublished - 2007

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