Surface interaction forces in chemical-mechanical planarization

Understanding the role of surface intra-molecular forces is critical in a variety of aspects of chemical-mechanical polishing technology. In this paper we explore some of the critical areas where this is an important parameter, such as material removal mechanisms in oxide polishing. Particular attention is given to the use of coupling single particle atomic force microscopy experiments with FTIR and TEM studies of polished oxide surfaces in studying the possible role of surface hydration effects in chemical-mechanical planarization of oxide thin films.