Summary Abstract: An x-ray standing wave interference spectrometric (XSWIS) analysis of bromine adsorbed on cleaved silicon from solution

B. N. Dev; V. Aristov; N. Hertel; T. Thundat; W. M. Gibson

doi:10.1116/1.573366

Summary Abstract: An x-ray standing wave interference spectrometric (XSWIS) analysis of bromine adsorbed on cleaved silicon from solution

B. N. Dev
, V. Aristov
, N. Hertel
, T. Thundat
, W. M. Gibson

Department of Chemical and Biological Engineering

SUNY Albany
Russian Academy of Sciences
Aarhus University

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Original language	English
Pages (from-to)	975
Number of pages	1
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	3
Issue number	3
DOIs	https://doi.org/10.1116/1.573366
State	Published - May 1985

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author = "Dev, \{B. N.\} and V. Aristov and N. Hertel and T. Thundat and Gibson, \{W. M.\}",

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T2 - An x-ray standing wave interference spectrometric (XSWIS) analysis of bromine adsorbed on cleaved silicon from solution

AU - Dev, B. N.

AU - Aristov, V.

AU - Hertel, N.

AU - Thundat, T.

AU - Gibson, W. M.

PY - 1985/5

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DO - 10.1116/1.573366

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AN - SCOPUS:84914777818

SN - 0734-2101

VL - 3

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JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 3

ER -

Summary Abstract: An x-ray standing wave interference spectrometric (XSWIS) analysis of bromine adsorbed on cleaved silicon from solution

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