Abstract
Epitaxial SrWO4 films were successfully deposited with or without a buffer layer on the sapphire substrate by pulsed-laser deposition. The interface structures were characterized by high resolution electron microscopy (HREM), and it indicated that the film deposited on a CeO 2 buffer layer shows a much better epitaxy than that deposited directly on the substrate, because of the small lattice mismatch between the film and the buffer layer. HREM also revealed definite orientation relationship among the film, the buffer layer, and the substrate, i.e. [1̄10](004̄)SrWO4//[11̄0](002) CeO2//[201̄2̄](1̄102̄)sapphire.
| Original language | English |
|---|---|
| Pages (from-to) | 95-98 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| Volume | 444 |
| Issue number | 1-2 |
| DOIs | |
| State | Published - Nov 1 2003 |
Keywords
- HREM
- Pulsed-laser deposition
- Strontium tungstate
- Thin films
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