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Strong light-matter coupling in ultrathin double dielectric mirror GaN microcavities

  • K. Bejtka
  • , F. Ŕveret
  • , R. W. Martin
  • , P. R. Edwards
  • , A. Vasson
  • , J. Leymarie
  • , I. R. Sellers
  • , J. Y. Duboz
  • , M. Leroux
  • , F. Semond
  • University of Strathclyde
  • CRHEA-CNRS
  • UMR 6602 UBP/CNRS

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

Strong light-matter coupling is demonstrated at low temperature in an ultrathin GaN microcavity fabricated using two silica/zirconia Bragg mirrors, in addition to a three-period epitaxial (Al,Ga)N mirror serving as an etch stop and assuring good quality of the overgrown GaN. The λ2 cavity is grown by molecular beam epitaxy on a Si substrate. Analysis of angle-resolved data reveal key features of the strong coupling regime in both reflectivity and transmission spectra at 5 K: anticrossing with a normal mode splitting of 43±2 meV and 56±2 meV for reflectivity and transmission, respectively, and narrowing of the lower polariton linewidth near resonance.

Original languageEnglish
Article number241105
JournalApplied Physics Letters
Volume92
Issue number24
DOIs
StatePublished - 2008

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