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Static-SiMS and ESCA analysis of UV photo-polymerization in diacetylene thin films

  • SUNY Buffalo

Research output: Contribution to journalConference articlepeer-review

Abstract

In the current work molecular secondary emission from diacetylene thin films on solid metal supports has been studied. The use of static-SIMS to monitor the extent of UV photo-polymerization in diacetylene thin films via the appearance or disappearance of molecular emission has been investigated. In addition, the potential of static-SIMS to quantify the extent of surface polymerization is discussed.

Original languageEnglish
Pages (from-to)863
Number of pages1
JournalPolymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering
Volume62
StatePublished - 1990
EventProceedings of the ACS Division of Polymeric Materials: Science and Engineering - Boston, MA, USA
Duration: Apr 1 1990Apr 1 1990

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