Abstract
Images stored in resist for soft X-ray lithography or microradiography were found to show a background noise which limits the resolution. This is due to the statistically variable spatial distribution of the photons incident on the resist surface. An estimate of the fundamental noise-limited resolution has been made from the experimental measurement of photon flux incident on the surface and the accurate development rate curves. Monochromatic radiation from a synchrotron source was used.
| Original language | English |
|---|---|
| Pages (from-to) | 192-198 |
| Number of pages | 7 |
| Journal | Journal of Materials Science |
| Volume | 31 |
| Issue number | 1 |
| DOIs | |
| State | Published - 1996 |
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