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Soft X-ray image storage in poly(methylmethacrylate)

  • Western University

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Images stored in resist for soft X-ray lithography or microradiography were found to show a background noise which limits the resolution. This is due to the statistically variable spatial distribution of the photons incident on the resist surface. An estimate of the fundamental noise-limited resolution has been made from the experimental measurement of photon flux incident on the surface and the accurate development rate curves. Monochromatic radiation from a synchrotron source was used.

Original languageEnglish
Pages (from-to)192-198
Number of pages7
JournalJournal of Materials Science
Volume31
Issue number1
DOIs
StatePublished - 1996

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