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Selectively implanted subcollector DHBTs

  • N. Parthasarathy
  • , Z. Griffith
  • , C. Kadow
  • , U. Singisetti
  • , M. J.W. Rodwell
  • , M. Urteaga
  • , K. Shinohara
  • , B. Brar
  • University of California at Santa Barbara
  • Infineon Technologies AG
  • Teledyne Technologies

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In0.53Ga0.47As/InP double heterojunction bipolar transistors with implanted subcollectors have been designed and fabricated to eliminate the base access pad capacitance. A blanket Fe implant eliminates the interface charge and a patterned Si implant creates an isolated N++ subcollector. The extrinsic base-collector capacitance Ccb associated with the base interconnect pad (∼25% of the total Ccb) is thus eliminated These implanted subcollector DHBTs have 363GHz ft and 410GHz fmax. The DC current gain β - 40, BVceo = 5.6V, BVcbo = 6.9V (Ic = 1 mA).

Original languageEnglish
Title of host publication2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings
Pages104-107
Number of pages4
StatePublished - 2006
Event2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings - Princeton, United States
Duration: May 7 2006May 11 2006

Publication series

NameConference Proceedings - International Conference on Indium Phosphide and Related Materials
Volume2006
ISSN (Print)1092-8669

Conference

Conference2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings
Country/TerritoryUnited States
CityPrinceton
Period05/7/0605/11/06

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