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Role of yttria-stabilized zirconia produced by ion-beam-assisted deposition on the properties of RuO2 on SiO2/Si

  • Q. X. Jia
  • , P. Arendt
  • , J. R. Groves
  • , Y. Fan
  • , J. M. Roper
  • , S. R. Foltyn
  • Los Alamos National Laboratory Materials Science and Technology Division

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Highly conductive biaxially textured RuO2 thin films were deposited on technically important SiO2/Si substrates by pulsed laser deposition, where yttria-stabilized zirconia (YSZ) produced by ion-beam-assisted-deposition (IBAD) was used as a template to enhance the biaxial texture of RuO2 on SiO2/Si. The biaxially oriented RuO2 had a room-temperature resistivity of 37 μΩ-cm and residual resistivity ratio above 2. We then deposited Ba0.5Sr0.5TiO3 thin films on RuO2/IBAD-YSZ/SiO2/Si. The Ba0.5Sr0.5TiO3 had a pure (111) orientation normal to the substrate surface and a dielectric constant above 360 at 100 kHz.

Original languageEnglish
Pages (from-to)2461-2464
Number of pages4
JournalJournal of Materials Research
Volume13
Issue number9
DOIs
StatePublished - Sep 1998

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