Abstract
Machine learning (ML) techniques have been recently employed to facilitate the development of novel two-dimensional (2D) materials. Among various synthesis approaches, chemical vapor deposition (CVD) has demonstrated tremendous potential in producing high-quality 2D flakes with good controllability, enabling large-scale production at a relatively low cost. Traditionally, the quality of CVD-grown samples can be manually evaluated based on optical images which is labor-intensive and time-consuming. In this paper, we explored a data-driven unsupervised quality assessment strategy based on image clustering via integrating self-organizing map (SOM) and k-means methods for optical image analysis of CVD-grown 2D materials. The high matching rate between the clustering results and material experts' labels indicated a good accuracy of the proposed clustering algorithm. The proposed unsupervised ML methodology will provide materials scientists with an effective tool kit for efficient evaluation of CVD-grown materials' quality and has a broad applicability for various material systems.
| Original language | English |
|---|---|
| Pages (from-to) | 15324-15333 |
| Number of pages | 10 |
| Journal | Nanoscale |
| Volume | 13 |
| Issue number | 36 |
| DOIs | |
| State | Published - Sep 28 2021 |
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