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Probing the microstructure in semiconductor layer materials using synchrotron radiation

Research output: Contribution to journalArticlepeer-review

Abstract

Advances in modern electronics and photonics depend crucially on technical capabilities to control the size, composition, and morphology of semiconductor layer structures. To exploit this important class of materials such as quantum wells and superlattices for technological applications, physical understanding of microscopic structures on the nanometer scale is needed.

Original languageEnglish
Pages (from-to)353-364
Number of pages12
JournalChinese Journal of Physics
Volume35
Issue number4
StatePublished - 1997

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