Skip to main navigation Skip to search Skip to main content

Potential Distributions in Metal-Semiconductor and p-i-n Structures on a-Si:H by Capacitive Techniques

  • SUNY Buffalo

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

C(Q)-f and C-V-f characteristics have been used to find the barrier profile and depletion width in several Schottky (i-n+) structures on a-Si:H. Depletion widths for Pd and Cr Schottky structures are estimated to be around 0.28 and 0.21 μm, respectively. Dark C-V measurements on these structures do not show the trends expected from the semiconductor behavior of the I region. Instead, trap controlled current conduction in the I layer fits the dark C-V characteristics. Dark I-V data further support this observation. Trends in the capacitance measurements on p-i-n structures have also been explained on the basis of the above model.

Original languageEnglish
Pages (from-to)889-893
Number of pages5
JournalIEEE Transactions on Electron Devices
Volume29
Issue number5
DOIs
StatePublished - May 1982

Fingerprint

Dive into the research topics of 'Potential Distributions in Metal-Semiconductor and p-i-n Structures on a-Si:H by Capacitive Techniques'. Together they form a unique fingerprint.

Cite this