Plasma processing of high Tc superconducting films

D. T. Shaw; S. Witanachchi; S. Patel; H. S. Kwok

Plasma processing of high T_c superconducting films

D. T. Shaw
, S. Witanachchi
, S. Patel
, H. S. Kwok

Department of Electrical Engineering

SUNY Buffalo

Research output: Contribution to conference › Paper › peer-review

Abstract

A method for plasma-assisted laser deposition of thin films has been developed by the authors and used to generate in-situ films at substrate temperatures between 400°C and 500°C without any postannealing. For Y-Ba-Cu-O superconductors, a zero-resistance temperature of about 90 K has been obtained for such substrate materials as SrTiO₃, ZrO₂, MgO, sapphire, Si, stainless steel, and Ni. Various surface and plasma analytical techniques have been applied to study the microstructure of the superconducting film and its interaction with the substrate and the plasma.

Original language	English
Pages	115-116
Number of pages	2
State	Published - 1989
Event	IEEE International Conference on Plasma Science 1989 - Buffalo, NY, USA Duration: May 22 1989 → May 24 1989

Conference

Conference	IEEE International Conference on Plasma Science 1989
City	Buffalo, NY, USA
Period	05/22/89 → 05/24/89

Cite this

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title = "Plasma processing of high Tc superconducting films",

abstract = "A method for plasma-assisted laser deposition of thin films has been developed by the authors and used to generate in-situ films at substrate temperatures between 400°C and 500°C without any postannealing. For Y-Ba-Cu-O superconductors, a zero-resistance temperature of about 90 K has been obtained for such substrate materials as SrTiO3, ZrO2, MgO, sapphire, Si, stainless steel, and Ni. Various surface and plasma analytical techniques have been applied to study the microstructure of the superconducting film and its interaction with the substrate and the plasma.",

author = "Shaw, \{D. T.\} and S. Witanachchi and S. Patel and Kwok, \{H. S.\}",

year = "1989",

language = "English",

pages = "115--116",

note = "IEEE International Conference on Plasma Science 1989 ; Conference date: 22-05-1989 Through 24-05-1989",

}

TY - CONF

T1 - Plasma processing of high Tc superconducting films

AU - Shaw, D. T.

AU - Witanachchi, S.

AU - Patel, S.

AU - Kwok, H. S.

PY - 1989

Y1 - 1989

N2 - A method for plasma-assisted laser deposition of thin films has been developed by the authors and used to generate in-situ films at substrate temperatures between 400°C and 500°C without any postannealing. For Y-Ba-Cu-O superconductors, a zero-resistance temperature of about 90 K has been obtained for such substrate materials as SrTiO3, ZrO2, MgO, sapphire, Si, stainless steel, and Ni. Various surface and plasma analytical techniques have been applied to study the microstructure of the superconducting film and its interaction with the substrate and the plasma.

AB - A method for plasma-assisted laser deposition of thin films has been developed by the authors and used to generate in-situ films at substrate temperatures between 400°C and 500°C without any postannealing. For Y-Ba-Cu-O superconductors, a zero-resistance temperature of about 90 K has been obtained for such substrate materials as SrTiO3, ZrO2, MgO, sapphire, Si, stainless steel, and Ni. Various surface and plasma analytical techniques have been applied to study the microstructure of the superconducting film and its interaction with the substrate and the plasma.

UR - https://www.scopus.com/pages/publications/0024899739

M3 - Paper

AN - SCOPUS:0024899739

SP - 115

EP - 116

T2 - IEEE International Conference on Plasma Science 1989

Y2 - 22 May 1989 through 24 May 1989

ER -

Plasma processing of high T_c superconducting films

Abstract

Conference

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