Photopatterning hybrid sol-gel glass materials prepared from ethylene tellurate and alkoxysilane

Photopatterning of sol-gels is a versatile technique that has been used to prepare optical components and devices of silica and titania. Telluria (TeO ₂) has a higher third-order non-linearity than silica and titania and offers advantages in optical devices. Ethylene tellurate was used as a high purity precursor in the preparation of nanoparticulate tellurium dioxide powders and glassy films by sol-gel processes. Powder and film samples were characterized by XRD, SEM and FTIR. The refractive index of the sol-gel derived telluria film was 1.67. [3-(Methacryloloxypropyl)]trimethoxysilane (MPTMS) was incorporated into ethylene tellurate sol-gels in order to allow photopatterning by polymerization and cross-linking of methacrylate functionality. UV exposure of films with a photomask was used to produce line patterns. FTIR measurements showed the disappearance of acrylate double bonds in MPTMS, indicating the polymerization and condensation of the films.