Abstract
Computer aided design (CAD) tools can expedite the development of high speed electrooptic modulators. The simulation program can be used to simulate the device performance, therefore, lead to the optimal design. The layout tool can be used to design mask patterns. Custom features specifically developed for electrooptic modulators make the mask pattern design highly efficient. The OPTOMASK layout program and results of simulations on low-loss Y-branch design and on quasi-linear electrooptic modulator design are reported.
| Original language | English |
|---|---|
| Pages (from-to) | 46-55 |
| Number of pages | 10 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 1371 |
| DOIs | |
| State | Published - 1991 |
| Event | High-Frequency Analog Fiber Optic Systems - San Jose, CA, USA Duration: Sep 17 1990 → Sep 18 1990 |
Fingerprint
Dive into the research topics of 'Photonic computer aided design tools for high speed optical modulators'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver