Abstract
We measure the channel potential of a graphene transistor using a scanning photocurrent imaging technique. We show that at a certain gate bias, the impact of the metal on the channel potential profile extends into the channel for more than one-third of the total channel length from both source and drain sides; hence, most of the channel is affected by the metal. The potential barrier between the metal-controlled graphene and bulk graphene channel is also measured at various gate biases. As the gate bias exceeds the Dirac point voltage, V Dirac, the original p-type graphene channel turns into a p-n-p channel. When light is focused on the p-n junctions, an impressive external responsivity of 0.001 A/W is achieved, given that only a single layer of atoms are involved in photon detection.
| Original language | English |
|---|---|
| Pages (from-to) | 1039-1044 |
| Number of pages | 6 |
| Journal | Nano Letters |
| Volume | 9 |
| Issue number | 3 |
| DOIs | |
| State | Published - Mar 11 2009 |
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