Abstract
The optimization of the growth of 1.3 μm InAs/InGaAs dots-in-a-well structure was investigated. The structural and optical properties of the structures were also analyzed. It was found that optical efficiency can be improved by increasing the growth rate of the InGaAs and GaAs layers.
| Original language | English |
|---|---|
| Pages (from-to) | 2931-2936 |
| Number of pages | 6 |
| Journal | Journal of Applied Physics |
| Volume | 93 |
| Issue number | 5 |
| DOIs | |
| State | Published - Mar 1 2003 |
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