Novel ion implantation based method for surface patterning

Chris P. McNorgan; Todd W. Simpson; Ian V. Mitchell

doi:10.1117/12.2283837

Novel ion implantation based method for surface patterning

Chris P. McNorgan
, Todd W. Simpson
, Ian V. Mitchell

Western University

Research output: Contribution to journal › Conference article › peer-review

Abstract

Recently, there has been much attention focused on photonic crystals and photonic bandgap materials [1], The fabrication of these materials requires the formation of a periodic variation in the refractive index on a submicrometer length scale. It is anticipated that these structures will provide the building blocks required for future photonic devices and photonic integrated circuits. Applications are envisaged for structures with both 2- and 3-dimensional periodicity. In this communication we report results from a novel variant of ion beam lithography. The approach involves ion implantation through a mask of silica microspheres, followed by selective chemical etching.

Original language	English
Article number	1031315
Pages (from-to)	104-106
Number of pages	3
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	10313
DOIs	https://doi.org/10.1117/12.2283837
State	Published - May 9 2002
Event	SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, Opto-Canada 2002 - Ottawa, Canada Duration: May 9 2002 → May 10 2002

Access to Document

10.1117/12.2283837

Cite this

@article{f669c13e10494ec1a42b309cebe752f1,

title = "Novel ion implantation based method for surface patterning",

abstract = "Recently, there has been much attention focused on photonic crystals and photonic bandgap materials [1], The fabrication of these materials requires the formation of a periodic variation in the refractive index on a submicrometer length scale. It is anticipated that these structures will provide the building blocks required for future photonic devices and photonic integrated circuits. Applications are envisaged for structures with both 2- and 3-dimensional periodicity. In this communication we report results from a novel variant of ion beam lithography. The approach involves ion implantation through a mask of silica microspheres, followed by selective chemical etching.",

author = "McNorgan, \{Chris P.\} and Simpson, \{Todd W.\} and Mitchell, \{Ian V.\}",

note = "Publisher Copyright: {\textcopyright} 2002 SPIE.; SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, Opto-Canada 2002 ; Conference date: 09-05-2002 Through 10-05-2002",

year = "2002",

month = may,

day = "9",

doi = "10.1117/12.2283837",

language = "English",

volume = "10313",

pages = "104--106",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

}

TY - JOUR

T1 - Novel ion implantation based method for surface patterning

AU - McNorgan, Chris P.

AU - Simpson, Todd W.

AU - Mitchell, Ian V.

PY - 2002/5/9

Y1 - 2002/5/9

N2 - Recently, there has been much attention focused on photonic crystals and photonic bandgap materials [1], The fabrication of these materials requires the formation of a periodic variation in the refractive index on a submicrometer length scale. It is anticipated that these structures will provide the building blocks required for future photonic devices and photonic integrated circuits. Applications are envisaged for structures with both 2- and 3-dimensional periodicity. In this communication we report results from a novel variant of ion beam lithography. The approach involves ion implantation through a mask of silica microspheres, followed by selective chemical etching.

AB - Recently, there has been much attention focused on photonic crystals and photonic bandgap materials [1], The fabrication of these materials requires the formation of a periodic variation in the refractive index on a submicrometer length scale. It is anticipated that these structures will provide the building blocks required for future photonic devices and photonic integrated circuits. Applications are envisaged for structures with both 2- and 3-dimensional periodicity. In this communication we report results from a novel variant of ion beam lithography. The approach involves ion implantation through a mask of silica microspheres, followed by selective chemical etching.

UR - https://www.scopus.com/pages/publications/85037530563

U2 - 10.1117/12.2283837

DO - 10.1117/12.2283837

M3 - Conference article

AN - SCOPUS:85037530563

SN - 0277-786X

VL - 10313

SP - 104

EP - 106

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 1031315

T2 - SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, Opto-Canada 2002

Y2 - 9 May 2002 through 10 May 2002

ER -

Novel ion implantation based method for surface patterning

Abstract

Access to Document

Other files and links

Fingerprint

Cite this