Nonlinear optical microscopy for imaging patterned self-assembled monolayers

L. Smilowitz; Q. X. Jia; X. Yang; D. Q. Li; D. McBranch; J. M. Robinson

Nonlinear optical microscopy for imaging patterned self-assembled monolayers

L. Smilowitz
, Q. X. Jia
, X. Yang
, D. Q. Li
, D. McBranch
, J. M. Robinson

Department of Materials Design and Innovation

Los Alamos National Laboratory

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

We have used the inherent surface sensitivity of second harmonic generation (SHG) to develop an instrument for nonlinear optical (NLO) microscopy of surfaces and interfaces. This optical technique is ideal for imaging nanometer thick self-assembled monolayers (SAM's) which have been patterned using photolithographic techniques. In this paper we demonstrate the application of SHG microscopy to patterned SAM's of the noncentrosymmetric molecule calixarene and discuss other potential applications for this new technique.

Original language	English
Pages (from-to)	209-214
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	440
State	Published - 1997
Event	Proceedings of the 1996 MRS Fall Symposium - Boston, MA, USA Duration: Dec 2 1996 → Dec 6 1996

Cite this

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title = "Nonlinear optical microscopy for imaging patterned self-assembled monolayers",

abstract = "We have used the inherent surface sensitivity of second harmonic generation (SHG) to develop an instrument for nonlinear optical (NLO) microscopy of surfaces and interfaces. This optical technique is ideal for imaging nanometer thick self-assembled monolayers (SAM's) which have been patterned using photolithographic techniques. In this paper we demonstrate the application of SHG microscopy to patterned SAM's of the noncentrosymmetric molecule calixarene and discuss other potential applications for this new technique.",

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year = "1997",

language = "English",

volume = "440",

pages = "209--214",

journal = "Materials Research Society Symposium - Proceedings",

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publisher = "Materials Research Society",

note = "Proceedings of the 1996 MRS Fall Symposium ; Conference date: 02-12-1996 Through 06-12-1996",

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T1 - Nonlinear optical microscopy for imaging patterned self-assembled monolayers

AU - Smilowitz, L.

AU - Jia, Q. X.

AU - Yang, X.

AU - Li, D. Q.

AU - McBranch, D.

AU - Robinson, J. M.

PY - 1997

Y1 - 1997

N2 - We have used the inherent surface sensitivity of second harmonic generation (SHG) to develop an instrument for nonlinear optical (NLO) microscopy of surfaces and interfaces. This optical technique is ideal for imaging nanometer thick self-assembled monolayers (SAM's) which have been patterned using photolithographic techniques. In this paper we demonstrate the application of SHG microscopy to patterned SAM's of the noncentrosymmetric molecule calixarene and discuss other potential applications for this new technique.

AB - We have used the inherent surface sensitivity of second harmonic generation (SHG) to develop an instrument for nonlinear optical (NLO) microscopy of surfaces and interfaces. This optical technique is ideal for imaging nanometer thick self-assembled monolayers (SAM's) which have been patterned using photolithographic techniques. In this paper we demonstrate the application of SHG microscopy to patterned SAM's of the noncentrosymmetric molecule calixarene and discuss other potential applications for this new technique.

UR - https://www.scopus.com/pages/publications/0031337624

M3 - Conference article

AN - SCOPUS:0031337624

SN - 0272-9172

VL - 440

SP - 209

EP - 214

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1996 MRS Fall Symposium

Y2 - 2 December 1996 through 6 December 1996

ER -

Nonlinear optical microscopy for imaging patterned self-assembled monolayers

Abstract

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