TY - GEN
T1 - Modification of nanoscale morphology and microstructure of heteroepitaxial, 200 nm thick CeO2 thin films via annealing
AU - Kumar, Rohit
AU - Peddireddy, Murali Ganesh
AU - Thundat, Thomas
AU - Goyal, Amit
N1 - Publisher Copyright:
© 2025 IEEE.
PY - 2025
Y1 - 2025
N2 - Cerium oxide (CeO2) is often used as a lattice-match cap layer for heteroepitaxial growth of REBa2Cu3O7-x (RE: rare earth) superconductors. In this work, we investigated how the nanostructure and grain size of CeO2 heteroepitaxial films on biaxially-textured, coated conductor substrates can be modified via annealing in humid, mixed N2/4%-H2 gas mixtures. X-Ray diffraction (XRD) analysis shows annealing at higher temperatures shifts the lattice constant to lower values. The full-width-half-maximum (FWHM) of omega and phi scans show that the in-plane and the out-of-plane crystallographic texture is relatively unchanged with post-annealing. Surface reconstruction, roughness and grain sizes were characterized using Atomic Force Microscopy (AFM).
AB - Cerium oxide (CeO2) is often used as a lattice-match cap layer for heteroepitaxial growth of REBa2Cu3O7-x (RE: rare earth) superconductors. In this work, we investigated how the nanostructure and grain size of CeO2 heteroepitaxial films on biaxially-textured, coated conductor substrates can be modified via annealing in humid, mixed N2/4%-H2 gas mixtures. X-Ray diffraction (XRD) analysis shows annealing at higher temperatures shifts the lattice constant to lower values. The full-width-half-maximum (FWHM) of omega and phi scans show that the in-plane and the out-of-plane crystallographic texture is relatively unchanged with post-annealing. Surface reconstruction, roughness and grain sizes were characterized using Atomic Force Microscopy (AFM).
UR - https://www.scopus.com/pages/publications/105027171815
U2 - 10.1109/NMDC64551.2025.11234646
DO - 10.1109/NMDC64551.2025.11234646
M3 - Conference contribution
AN - SCOPUS:105027171815
T3 - 2025 IEEE 20th Nanotechnology Materials and Devices Conference, NMDC 2025
SP - 315
EP - 320
BT - 2025 IEEE 20th Nanotechnology Materials and Devices Conference, NMDC 2025
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 20th IEEE Nanotechnology Materials and Devices Conference, NMDC 2025
Y2 - 9 October 2025 through 11 October 2025
ER -