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Modification of nanoscale morphology and microstructure of heteroepitaxial, 200 nm thick CeO2 thin films via annealing

  • SUNY Buffalo

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Cerium oxide (CeO2) is often used as a lattice-match cap layer for heteroepitaxial growth of REBa2Cu3O7-x (RE: rare earth) superconductors. In this work, we investigated how the nanostructure and grain size of CeO2 heteroepitaxial films on biaxially-textured, coated conductor substrates can be modified via annealing in humid, mixed N2/4%-H2 gas mixtures. X-Ray diffraction (XRD) analysis shows annealing at higher temperatures shifts the lattice constant to lower values. The full-width-half-maximum (FWHM) of omega and phi scans show that the in-plane and the out-of-plane crystallographic texture is relatively unchanged with post-annealing. Surface reconstruction, roughness and grain sizes were characterized using Atomic Force Microscopy (AFM).

Original languageEnglish
Title of host publication2025 IEEE 20th Nanotechnology Materials and Devices Conference, NMDC 2025
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages315-320
Number of pages6
ISBN (Electronic)9798331580728
DOIs
StatePublished - 2025
Event20th IEEE Nanotechnology Materials and Devices Conference, NMDC 2025 - Delhi, India
Duration: Oct 9 2025Oct 11 2025

Publication series

Name2025 IEEE 20th Nanotechnology Materials and Devices Conference, NMDC 2025

Conference

Conference20th IEEE Nanotechnology Materials and Devices Conference, NMDC 2025
Country/TerritoryIndia
CityDelhi
Period10/9/2510/11/25

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