Modeling CVD processes

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

1 Scopus citations

Original language	English
Title of host publication	Chemical Vapour Deposition
Subtitle of host publication	Precursors, Processes and Applications
Publisher	RSC
Pages	93-157
Number of pages	65
ISBN (Electronic)	9781847558794
ISBN (Print)	9780854044658
DOIs	https://doi.org/10.1039/9781847558794-00093
State	Published - Dec 17 2008

Access to Document

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title = "Modeling CVD processes",

author = "Allendorf, \{Mark D.\} and Besmann, \{Theodore M.\} and Kee, \{Robert J.\} and Swihart, \{Mark T.\}",

year = "2008",

month = dec,

day = "17",

doi = "10.1039/9781847558794-00093",

language = "English",

isbn = "9780854044658",

pages = "93--157",

booktitle = "Chemical Vapour Deposition",

publisher = "RSC",

}

TY - CHAP

T1 - Modeling CVD processes

AU - Allendorf, Mark D.

AU - Besmann, Theodore M.

AU - Kee, Robert J.

AU - Swihart, Mark T.

PY - 2008/12/17

Y1 - 2008/12/17

UR - https://www.scopus.com/pages/publications/105014567883

U2 - 10.1039/9781847558794-00093

DO - 10.1039/9781847558794-00093

M3 - Chapter

AN - SCOPUS:105014567883

SN - 9780854044658

SP - 93

EP - 157

BT - Chemical Vapour Deposition

PB - RSC

ER -