Microstructure of Fe film on Si grown by MOCVD

Zheng Youdou; Zhang Rong; T. W. Kim; B. D. McCombe

doi:10.1016/0749-6036(88)90172-3

Microstructure of Fe film on Si grown by MOCVD

Zheng Youdou
, Zhang Rong
, T. W. Kim
, B. D. McCombe

Physics

Nanjing University
SUNY Buffalo

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Fe epitaxial films were grown on Si(100) substrate by MOCVD using thermal decomposition of iron pentacarbonyl, Fe(CO)₅. X-ray diffraction and XPS spectroscopy were used to study the structure of the epitaxial film. The results indicate that single crystal Fe film and iron oxide-iron-silicon multilayer structure can be grown on Si (100) substrate. We have also discussed the relation between microstructure and MOCVD process.

Original language	English
Pages (from-to)	307-309
Number of pages	3
Journal	Superlattices and Microstructures
Volume	4
Issue number	3
DOIs	https://doi.org/10.1016/0749-6036(88)90172-3
State	Published - 1988

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title = "Microstructure of Fe film on Si grown by MOCVD",

abstract = "Fe epitaxial films were grown on Si(100) substrate by MOCVD using thermal decomposition of iron pentacarbonyl, Fe(CO)5. X-ray diffraction and XPS spectroscopy were used to study the structure of the epitaxial film. The results indicate that single crystal Fe film and iron oxide-iron-silicon multilayer structure can be grown on Si (100) substrate. We have also discussed the relation between microstructure and MOCVD process.",

author = "Zheng Youdou and Zhang Rong and Kim, \{T. W.\} and McCombe, \{B. D.\}",

year = "1988",

doi = "10.1016/0749-6036(88)90172-3",

language = "English",

volume = "4",

pages = "307--309",

journal = "Superlattices and Microstructures",

issn = "0749-6036",

publisher = "Academic Press Inc.",

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TY - JOUR

T1 - Microstructure of Fe film on Si grown by MOCVD

AU - Youdou, Zheng

AU - Rong, Zhang

AU - Kim, T. W.

AU - McCombe, B. D.

PY - 1988

Y1 - 1988

N2 - Fe epitaxial films were grown on Si(100) substrate by MOCVD using thermal decomposition of iron pentacarbonyl, Fe(CO)5. X-ray diffraction and XPS spectroscopy were used to study the structure of the epitaxial film. The results indicate that single crystal Fe film and iron oxide-iron-silicon multilayer structure can be grown on Si (100) substrate. We have also discussed the relation between microstructure and MOCVD process.

AB - Fe epitaxial films were grown on Si(100) substrate by MOCVD using thermal decomposition of iron pentacarbonyl, Fe(CO)5. X-ray diffraction and XPS spectroscopy were used to study the structure of the epitaxial film. The results indicate that single crystal Fe film and iron oxide-iron-silicon multilayer structure can be grown on Si (100) substrate. We have also discussed the relation between microstructure and MOCVD process.

UR - https://www.scopus.com/pages/publications/0024126845

U2 - 10.1016/0749-6036(88)90172-3

DO - 10.1016/0749-6036(88)90172-3

M3 - Article

AN - SCOPUS:0024126845

SN - 0749-6036

VL - 4

SP - 307

EP - 309

JO - Superlattices and Microstructures

JF - Superlattices and Microstructures

IS - 3

ER -

Microstructure of Fe film on Si grown by MOCVD

Abstract

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