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Metal-induced nickel silicide nanowire growth mechanism in the solid state reaction

  • SUNY Buffalo
  • Pohang University of Science and Technology
  • Seoul National University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A unique nanowire growth was accomplished at 575°C by metal-induced growth (MIG). That is a spontaneous reaction between metal and Si. The deposited metal worked as a catalyst layer to grow nanowires in the solid-state. Various metals (Ni, Co, and Pd) were used in MIG nanowire fabrication and the Ni-induced case was successful in demonstrating that metal species should be a dominant mover in nanowire growth. Transmission electron microscopy investigation was performed to observe the nanowire growth direction. The Ni to Si composition was studied by energy dispersive spectroscopy showing the Ni diffusion inside the nanowire as well as the Ni silicide layer.

Original languageEnglish
Title of host publicationAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2006
Pages535-540
Number of pages6
StatePublished - 2007
Event2006 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 18 2006Apr 21 2006

Publication series

NameMaterials Research Society Symposium Proceedings
Volume910
ISSN (Print)0272-9172

Conference

Conference2006 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period04/18/0604/21/06

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