Measuring the oxygen diffusion in c-axis oriented erba2cu3ox films using in situ x-ray diffraction technique

Eiki Narumi; David T. Shaw

doi:10.1143/JJAP.29.L772

Measuring the oxygen diffusion in c-axis oriented erba₂cu₃o_x films using in situ x-ray diffraction technique

Eiki Narumi
, David T. Shaw

Department of Electrical Engineering

SUNY Buffalo
Furukawa Electric Co., Ltd.

Research output: Contribution to journal › Article › peer-review

Abstract

An in situ X-ray technique was used to study the diffusion of oxygen in c-axis oriented ErBa₂Cu₃O_x films made by rf magnetron sputtering. The diffusion is mainly parallel to the c-axis of the film, and the coefficients for oxygen diffusion are estimated to be in the order of 10^-14 and 10^-12 cm²·s^-1 at annealing temperatures of 500°C and 900°C, respectively.

Original language	English
Pages (from-to)	L772-L774
Journal	Japanese Journal of Applied Physics
Volume	29
Issue number	5
DOIs	https://doi.org/10.1143/JJAP.29.L772
State	Published - May 1990

Keywords

C-axis orientation
Oxygen diffusion
Superconductor
Thin film
X-ray diffraction

Access to Document

10.1143/JJAP.29.L772

Cite this

@article{458d126daaf84d8da6927fcc51e46c3d,

title = "Measuring the oxygen diffusion in c-axis oriented erba2cu3ox films using in situ x-ray diffraction technique",

abstract = "An in situ X-ray technique was used to study the diffusion of oxygen in c-axis oriented ErBa2Cu3Ox films made by rf magnetron sputtering. The diffusion is mainly parallel to the c-axis of the film, and the coefficients for oxygen diffusion are estimated to be in the order of 10-14 and 10-12 cm2·s-1 at annealing temperatures of 500°C and 900°C, respectively.",

keywords = "C-axis orientation, Oxygen diffusion, Superconductor, Thin film, X-ray diffraction",

author = "Eiki Narumi and Shaw, \{David T.\}",

year = "1990",

month = may,

doi = "10.1143/JJAP.29.L772",

language = "English",

volume = "29",

pages = "L772--L774",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "5",

}

TY - JOUR

T1 - Measuring the oxygen diffusion in c-axis oriented erba2cu3ox films using in situ x-ray diffraction technique

AU - Narumi, Eiki

AU - Shaw, David T.

PY - 1990/5

Y1 - 1990/5

N2 - An in situ X-ray technique was used to study the diffusion of oxygen in c-axis oriented ErBa2Cu3Ox films made by rf magnetron sputtering. The diffusion is mainly parallel to the c-axis of the film, and the coefficients for oxygen diffusion are estimated to be in the order of 10-14 and 10-12 cm2·s-1 at annealing temperatures of 500°C and 900°C, respectively.

AB - An in situ X-ray technique was used to study the diffusion of oxygen in c-axis oriented ErBa2Cu3Ox films made by rf magnetron sputtering. The diffusion is mainly parallel to the c-axis of the film, and the coefficients for oxygen diffusion are estimated to be in the order of 10-14 and 10-12 cm2·s-1 at annealing temperatures of 500°C and 900°C, respectively.

KW - C-axis orientation

KW - Oxygen diffusion

KW - Superconductor

KW - Thin film

KW - X-ray diffraction

UR - https://www.scopus.com/pages/publications/0025432022

U2 - 10.1143/JJAP.29.L772

DO - 10.1143/JJAP.29.L772

M3 - Article

AN - SCOPUS:0025432022

SN - 0021-4922

VL - 29

SP - L772-L774

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 5

ER -

Measuring the oxygen diffusion in c-axis oriented erba₂cu₃o_x films using in situ x-ray diffraction technique

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this