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Martensitic transformation in Ni50Ti50 films

  • Quanmin Su
  • , Susan Z. Hua
  • , Manfred Wuttig
  • University of Maryland, College Park

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

The elasticity and anelasticity of Ni50Ti50 films deposited on Si substrates was studied yielding information on the damping and modulus softening. It was found that the transformation behavior strongly depends on the film thickness and approaches bulk Ni50Ti50 behavior as the film becomes a few μm thick. For the same film thickness, the transformadon depends on the film/substrate adhesion. In films with good adhesion cross sectional Transmission Electron Microscopy (TEM) reveals a thin parent phase layer which does not transform while the bulk part of me Ni50Ti50 film transforms. It is thus proposed that interface constraints stabilize the B2 structure. A microscopic interpretadon in terms of transformation strains at the interface is given.

Original languageEnglish
Pages (from-to)409-412
Number of pages4
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume2189
DOIs
StatePublished - May 1 1994
Event1994 North American Conference on Smart Structures and Materials: Smart Materials - Orlando, United States
Duration: Feb 13 1994Feb 18 1994

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