Abstract
The device is composed of a series of p-n junction avalanche regions separated by undoped drift regions. The length and doping profile are chosen so that (1) the built-in potential of each p-n is nearly equal to but always less than the energy gap E//g, and therefore, tunneling does not take place; and (2) the total length of each p-n junction is nearly equal to its depletion region. Therefore, any applied reverse bias cannot further increase the built-in potential. Instead a voltage drop is uniformly distributed on the whole semiconductor. By spatially confining the avalanche regions' abrupt junctions, the noise due to the randomness in the number of impact ionizations per carrier transit is reduced.
| Original language | English |
|---|---|
| Title of host publication | Unknown Host Publication Title |
| Publisher | Optical Soc of America |
| Pages | 122 |
| Number of pages | 1 |
| ISBN (Print) | 0936659416 |
| State | Published - 1987 |
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