Skip to main navigation Skip to search Skip to main content

Low energy ion beam assisted grain size evolution in thin film deposition

  • IBM
  • Rensselaer Polytechnic Institute
  • North Carolina State University

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

In this paper, we demonstrate the value of applying new microstructural metrics in the characterization of grain size variations associated with the effects of very low energy ion beam assisted deposition of nickel thin films. It is shown that the apparent changes in grain size are associated with specific texture components. It is suggested that these descriptions of grain growth during deposition may provide more meaningful interpretations of the atomistic level mechanisms influencing grain size changes associated with very low energy ion beam deposition of thin films.

Original languageEnglish
Pages (from-to)1270-1273
Number of pages4
JournalJournal of Electronic Materials
Volume26
Issue number11
DOIs
StatePublished - Nov 1997

Keywords

  • Grain size
  • Ion beam deposition
  • Microstructural metrics
  • Nickel thin films

Fingerprint

Dive into the research topics of 'Low energy ion beam assisted grain size evolution in thin film deposition'. Together they form a unique fingerprint.

Cite this