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Lifetime estimation using ring oscillators for prediction in FinFET Technology

  • Shu Han Hsu
  • , Kexin Yang
  • , Rui Zhang
  • , Linda Milor
  • Georgia Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Lifetime testing of circuits is challenging because of the need to design circuit-specific test structures and test patterns. The goal of this work is to find a ring oscillator that matches a circuit's wearout behavior limited by time-dependent dielectric breakdown (TDDB), electromigration (EM), and stress-induced voiding (SIV) lifetime distributions, which can be used to foreworn circuit breakdown. The equivalent ring oscillator is easier to test, enabling the collection of more experimental lifetime data. Therefore, this paper aims to find the appropriate ring oscillator for a target circuit by mapping the lifetime of a circuit to a ring oscillator using analytical equations that involve layout parameters (area, length, width of device and interconnect) and operating conditions (supply voltage, temperature, probability of stress, current). Practical ring oscillator equations for lifetime estimation were derived, which describe relationships between stage number, oscillation frequency, characteristic lifetime, and Weibull parameters. The methodology is illustrated with example circuits that were implemented with 14nm FinFET technology.

Original languageEnglish
Title of host publication2018 IEEE International Integrated Reliability Workshop, IIRW 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781538660393
DOIs
StatePublished - Oct 2018
Event2018 IEEE International Integrated Reliability Workshop, IIRW 2018 - South Lake Tahoe, United States
Duration: Oct 7 2018Oct 11 2018

Publication series

NameIEEE International Integrated Reliability Workshop Final Report
ISSN (Print)1930-8841
ISSN (Electronic)2374-8036

Conference

Conference2018 IEEE International Integrated Reliability Workshop, IIRW 2018
Country/TerritoryUnited States
CitySouth Lake Tahoe
Period10/7/1810/11/18

Keywords

  • Electromigration
  • FinFET technology
  • Lifetime estimation
  • Ring oscillator
  • Stress-induced voiding
  • Time-dependent dielectric breakdown

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