Skip to main navigation Skip to search Skip to main content

Laser annealing of ferroelectric SrBi2Ta2O 9, Pb(ZrxTi1-x)O3 and CeMnO 3 thin films

  • N. M. Sbrockey
  • , J. D. Cuchiaro
  • , L. G. Provost
  • , C. E. Rice
  • , S. Sun
  • , G. S. Tompa
  • , R. L. DeLeon
  • , T. S. Kalkur
  • Structured Materials Industries, Inc.
  • University of Colorado Colorado Springs

Research output: Contribution to journalConference articlepeer-review

Abstract

Excimer laser annealing studies were conducted of SrBi2Ta 2O9, Pb(ZrxTi1-x)O3 and CeMnO3 thin films. The main incentive was to develop a low temperature process for SrBi2Ta2O9 thin films, which typically require a 750 C anneal to crystallize and achieve optimum ferroelectric properties. The results show that room temperature laser annealing can crystallize SrBi2Ta2O9, with a strong (200) preferred orientation, The Pb(ZrxTi1-x)O3 and CeMnO3 thin films investigated in this study were crystalline as deposited. Laser annealing of the Pb(ZrxTi1-x)O 3 and CeMnO3 films did not result in a significant increase in crystallinity, as evidenced by the intensities of the x-ray diffraction peaks. Electrical characterization of laser annealed SrBi 2Ta2O9 thin films showed good dielectric properties and the onset of ferroelectric behavior. Low temperature laser annealing is shown to be a viable approach to enable integration of ferroelectric SrBi2Ta2O9 films with silicon based micro-electronics, for ferroelectric memory applications.

Original languageEnglish
Pages (from-to)157-162
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume784
DOIs
StatePublished - 2003
EventFerroelectric Thin Films XII - Boston, MA, United States
Duration: Dec 1 2003Dec 4 2003

Fingerprint

Dive into the research topics of 'Laser annealing of ferroelectric SrBi2Ta2O 9, Pb(ZrxTi1-x)O3 and CeMnO 3 thin films'. Together they form a unique fingerprint.

Cite this