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Iron-copper nitride thin films fabricated by sputtering

  • Xingwu Wang
  • , James P. Parry
  • , Hrishikesh Kamat
  • , Ruikun Pan
  • , Hao Zeng
  • Alfred University
  • SUNY Buffalo
  • Hubei University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Iron nitride thin films have unique magnetic properties and wide applications, and copper nitride may have its potential applications in the electronics devices. In this work, iron-copper nitride thin films were fabricated by sputtering techniques. The film thickness varied from 70 nm to 160 nni depending on the deposition parameters such as power source, magnitude of applied power, deposition time and nitrogen/argon flowrates. Materials properties were characterized by scanning electron microscopy (SEM), x-ray diffraction (XRD), x-ray reflectivity (XRR), x-ray photoelectron spectroscopy (XPS) and vibration sample magnetometer (VSM). The effect of copper nitride on the magnetic properties of FeN thin films is observed.

Original languageEnglish
Title of host publicationDevelopments in Strategic Ceramic Materials - A Collection of Papers Presented at the 39th International Conference on Advanced Ceramics and Composites
EditorsDongming Zhu, Thomas Fischer, Jingyang Wang, Waltraud M. Kriven
PublisherAmerican Ceramic Society
Pages239-250
Number of pages12
Edition8
ISBN (Print)9781119040439
StatePublished - 2016
EventDevelopments in Strategic Ceramic Materials - 39th International Conference on Advanced Ceramics and Composites, ICACC 2015 - Daytona Beach, United States
Duration: Jan 25 2015Jan 30 2015

Publication series

NameCeramic Engineering and Science Proceedings
Number8
Volume36
ISSN (Print)0196-6219

Conference

ConferenceDevelopments in Strategic Ceramic Materials - 39th International Conference on Advanced Ceramics and Composites, ICACC 2015
Country/TerritoryUnited States
CityDaytona Beach
Period01/25/1501/30/15

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