Intermediate voltage (S)TEM microanalysis

This paper describes the quantitative and experimental assessment of electron beam spreading in thin foils at 300 kV. The results are used to determine the practical resolution limits of X-ray microanalysis in a (S)TEM mode configuration at 300 kV. Some precautions of microanalysis at such intermediate voltages include the proper saturation of the filament and the concerns of surface sputtering which can lead to the degradation of spatial resolution for microanalysis. A quantitative tabultion of k-factors for X-ray microanalysis at 300 kV is also presented for the first time.