Abstract
We report the first measurement of local structure in the thin layers of a semiconductor superlattice using the extended x-ray absorption fine structure. The measured values of interatomic distance and Debye-Waller factor in InAs offer a direct confirmation of the structure as intended in the growth process, and set an upper limit of the lattice strain to less than 1.5%. The data also indicate an anisotropy of the electron mean-free path in the thin layers and structural disorder at distances beyond the nearest neighbors.
| Original language | English |
|---|---|
| Pages (from-to) | 8308-8310 |
| Number of pages | 3 |
| Journal | Physical Review B-Condensed Matter |
| Volume | 31 |
| Issue number | 12 |
| DOIs | |
| State | Published - 1985 |
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