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Influences of the spacer layer growth temperature on multilayer InAs/GaAs quantum dot structures

  • H. Y. Liu
  • , I. R. Sellers
  • , M. Gutiérrez
  • , K. M. Groom
  • , W. M. Soong
  • , M. Hopkinson
  • , J. P.R. David
  • , R. Beanland
  • , T. J. Badcock
  • , D. J. Mowbray
  • , M. S. Skolnick
  • University of Sheffield
  • Bookham Technology plc

Research output: Contribution to journalArticlepeer-review

92 Scopus citations

Abstract

The effects of GaAs spacer layer growth temperature on the properties of multilayer InAs quantum dot (QD) structures were discussed. As a consequence of surface roughness of the underlying GaAs spacer layers, dislocations nucleate around incoherent islands and extend through subsequent dot layers, for structures with the GaAs spacer layers deposited at low temperature. It was found that the high growth temperature GaAs spacer layers eliminate the surface roughness and suppress the formation of defects. Through the use of the high growth temperature spacer layer (HGTSL), identical QD layers in a 5-layer structure were obtained.

Original languageEnglish
Pages (from-to)1988-1992
Number of pages5
JournalJournal of Applied Physics
Volume96
Issue number4
DOIs
StatePublished - Aug 15 2004

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