Abstract
The hydrogen-induced degradation in epitaxial and polycrystalline (Ba,Sr) TiO 3 (BST) thin films prepared on SrRuO 3 was studied. The polycrystalline BST was deposited on SrRuO 3 (SRO)/SiO x/Si. The dielectric response and leakage current characteristics before and after annealing in forming gas at 450°C was measured. It was found that the epitaxial BST films were highly immune to hydrogen degration, and the grain boundary was one of the main sources of hydrogen-induced degradation.
| Original language | English |
|---|---|
| Pages (from-to) | 3825-3827 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 84 |
| Issue number | 19 |
| DOIs | |
| State | Published - May 10 2004 |
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