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High-reflectivity DUV mirrors prepared by direct sputtering

  • Hongjun Yang
  • , Deyin Zhao
  • , Shih Chia Liu
  • , Yonghao Liu
  • , Jung Hun Seo
  • , Matt Hodek
  • , Zhenqiang Ma
  • , John D. Albrecht
  • , Baxter Moody
  • , Weidong Zhou
  • University of Texas at Arlington
  • Michigan State University
  • University of Wisconsin-Madison
  • HexaTech, Inc.

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report here high-reflectivity multilayer DBR mirrors in 200-240 nm spectral region. YSZ (yttria-stabilized zirconia), HfO2 and SiO2 films were all prepared by direct RF magnetron sputtering. The film annealing conditions were systematically varied to obtain layers with minimal optical absorption. Combining these results, high reflectivity YSZ/SiO2 and HfO2/SiO2 DBRs were designed and realized with reflectance greater than 99.9%.

Original languageEnglish
Title of host publication2016 Conference on Lasers and Electro-Optics, CLEO 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781943580118
DOIs
StatePublished - Dec 16 2016
Event2016 Conference on Lasers and Electro-Optics, CLEO 2016 - San Jose, United States
Duration: Jun 5 2016Jun 10 2016

Publication series

Name2016 Conference on Lasers and Electro-Optics, CLEO 2016

Conference

Conference2016 Conference on Lasers and Electro-Optics, CLEO 2016
Country/TerritoryUnited States
CitySan Jose
Period06/5/1606/10/16

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