High-Reflectivity DUV Mirrors Prepared by Direct Sputtering

Hongjun Yang; Deyin Zhao; Shih Chia Liu; Yonghao Liu; Jung Hun Seo; Matt Hodek; Zhenqiang Ma; John D. Albrecht; Baxter Moody; Weidong Zhou

High-Reflectivity DUV Mirrors Prepared by Direct Sputtering

Hongjun Yang
, Deyin Zhao
, Shih Chia Liu
, Yonghao Liu
, Jung Hun Seo
, Matt Hodek
, Zhenqiang Ma
, John D. Albrecht
, Baxter Moody
, Weidong Zhou

Department of Materials Design and Innovation

University of Texas at Arlington
Michigan State University
University of Wisconsin-Madison
HexaTech, Inc.

Research output: Contribution to journal › Conference article › peer-review

Abstract

We report here high-reflectivity multilayer DBR mirrors in 200-240 nm spectral region. YSZ (yttria-stabilized zirconia), HfO₂ and SiO₂ films were all prepared by direct RF magnetron sputtering. The film annealing conditions were systematically varied to obtain layers with minimal optical absorption. Combining these results, high reflectivity YSZ/SiO₂ and HfO₂/SiO₂ DBRs were designed and realized with reflectance greater than 99.9%.

Original language	English
Article number	2016-STu3R.3
Journal	Optics InfoBase Conference Papers
State	Published - 2016
Event	CLEO: Science and Innovations, SI 2016 - San Jose, United States Duration: Jun 5 2016 → Jun 10 2016

Cite this

@article{1d53a9dab81346cc89a22b5b4b15da8d,

title = "High-Reflectivity DUV Mirrors Prepared by Direct Sputtering",

abstract = "We report here high-reflectivity multilayer DBR mirrors in 200-240 nm spectral region. YSZ (yttria-stabilized zirconia), HfO2 and SiO2 films were all prepared by direct RF magnetron sputtering. The film annealing conditions were systematically varied to obtain layers with minimal optical absorption. Combining these results, high reflectivity YSZ/SiO2 and HfO2/SiO2 DBRs were designed and realized with reflectance greater than 99.9\%.",

author = "Hongjun Yang and Deyin Zhao and Liu, \{Shih Chia\} and Yonghao Liu and Seo, \{Jung Hun\} and Matt Hodek and Zhenqiang Ma and Albrecht, \{John D.\} and Baxter Moody and Weidong Zhou",

note = "Publisher Copyright: {\textcopyright} OSA 2016.; CLEO: Science and Innovations, SI 2016 ; Conference date: 05-06-2016 Through 10-06-2016",

year = "2016",

language = "English",

journal = "Optics InfoBase Conference Papers",

issn = "2162-2701",

}

TY - JOUR

T1 - High-Reflectivity DUV Mirrors Prepared by Direct Sputtering

AU - Yang, Hongjun

AU - Zhao, Deyin

AU - Liu, Shih Chia

AU - Liu, Yonghao

AU - Seo, Jung Hun

AU - Hodek, Matt

AU - Ma, Zhenqiang

AU - Albrecht, John D.

AU - Moody, Baxter

AU - Zhou, Weidong

PY - 2016

Y1 - 2016

N2 - We report here high-reflectivity multilayer DBR mirrors in 200-240 nm spectral region. YSZ (yttria-stabilized zirconia), HfO2 and SiO2 films were all prepared by direct RF magnetron sputtering. The film annealing conditions were systematically varied to obtain layers with minimal optical absorption. Combining these results, high reflectivity YSZ/SiO2 and HfO2/SiO2 DBRs were designed and realized with reflectance greater than 99.9%.

AB - We report here high-reflectivity multilayer DBR mirrors in 200-240 nm spectral region. YSZ (yttria-stabilized zirconia), HfO2 and SiO2 films were all prepared by direct RF magnetron sputtering. The film annealing conditions were systematically varied to obtain layers with minimal optical absorption. Combining these results, high reflectivity YSZ/SiO2 and HfO2/SiO2 DBRs were designed and realized with reflectance greater than 99.9%.

UR - https://www.scopus.com/pages/publications/85136579538

M3 - Conference article

AN - SCOPUS:85136579538

SN - 2162-2701

JO - Optics InfoBase Conference Papers

JF - Optics InfoBase Conference Papers

M1 - 2016-STu3R.3

T2 - CLEO: Science and Innovations, SI 2016

Y2 - 5 June 2016 through 10 June 2016

ER -

High-Reflectivity DUV Mirrors Prepared by Direct Sputtering

Abstract

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