High-density silicon and silicon nitride cones

High-density cone-shaped silicon and silicon nitride have been synthesized on Si(100) substrates via plasma-assisted hot-filament chemical vapor deposition using a gas mixture of nitrogen, hydrogen and methane. Aligned silicon cones containing 3-10 at% C and N have been formed with less than 1 h growth. Further growth can lead to the increase of cone size and density, as well as to the formation of polycrystalline silicon nitride films on the tip and surface. The formation of these materials is thought to be due to the remodification of Si substrates under the effect of plasma and active C and N species. Different nucleation and growth styles were obtained under different growth conditions and reactive gas mixtures.