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Heterostructure device on the cleaved edge of a superlattice for terahertz power generation

  • Z. S. Gribnikov
  • , N. Z. Vagidov
  • , H. Eisele
  • , V. V. Mitin
  • , G. I. Haddad
  • Wayne State University
  • University of Michigan, Ann Arbor

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

A novel device structure for terahertz power generation is proposed. The energy-wave vector dispersion relation ε(k) of electrons in this structure can be designed such that it contains sections of a negative effective mass within favorable ranges of energy ε and wave vector k. This design is based on the parallel electron transport in the combination of a quantum wall and a superlattice. The quantum well is grown on the cleaved edge of this superlattice and provides channel 1 with a low effective electron mass. Electrons in the superlattice as channel 2 have a large effective mass in the lowest quantization miniband of the superlattice. The effective thickness of the channel 2 can be controlled with the electric field from the p-n junction that is formed between n-type sheet doping concentration in the barrier layer of the quantum well and the p-type doping concentration in the superlattice. A simplified calculation scheme for obtaining the hybrid electron dispersion relation for the quantum real space transfer in such a two-channel combination is described and illustrated.

Original languageEnglish
Title of host publication2001 International Semiconductor Device Research Symposium, ISDRS 2001 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages559-562
Number of pages4
ISBN (Electronic)0780374320, 9780780374324
DOIs
StatePublished - 2001
EventInternational Semiconductor Device Research Symposium, ISDRS 2001 - Washington, United States
Duration: Dec 5 2001Dec 7 2001

Publication series

Name2001 International Semiconductor Device Research Symposium, ISDRS 2001 - Proceedings

Conference

ConferenceInternational Semiconductor Device Research Symposium, ISDRS 2001
Country/TerritoryUnited States
CityWashington
Period12/5/0112/7/01

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