Skip to main navigation Skip to search Skip to main content

Giant magnetoresistance peaks in CoNiCu/Cu multilayers grown by electrodeposition

  • S. Z. Hua
  • , D. S. Lashmore
  • , L. Salamanca-Riba
  • , W. Schwarzacher
  • , L. J. Swartzenruber
  • , R. D. McMichael
  • , L. H. Bennett
  • , R. Hart
  • National Institute of Standards and Technology
  • University of Maryland, College Park
  • University of Bristol

Research output: Contribution to journalArticlepeer-review

58 Scopus citations

Abstract

Giant magnetoresistance (GMR) of CoNiCu/Cu multilayers grown by electrodeposition was measured as a function of the copper layer thickness and effects of the order of 14% were obtained. The copper layer thickness ranged from 0.7 to 3.5 nm. Two peaks in the magnetoresistance were observed. One was centered at a copper thickness of ∼1.0 nm and the second was centered at ∼2.3 nm. Comparison of the field dependence of the magnetoresistance with the field dependence of the magnetization, as determined by vibrating-sample magnetometer, suggests that the saturation field for GMR and the magnetization are similar for the larger copper thicknesses, but are strikingly different near 1.0 nm copper thickness. This observation suggests that the GMR is affected by different factors depending on the thickness of the copper layer.

Original languageEnglish
Pages (from-to)6519-6521
Number of pages3
JournalJournal of Applied Physics
Volume76
Issue number10
DOIs
StatePublished - 1994

Fingerprint

Dive into the research topics of 'Giant magnetoresistance peaks in CoNiCu/Cu multilayers grown by electrodeposition'. Together they form a unique fingerprint.

Cite this