Fourier-Transform Infrared and Electron Spectroscopy for Chemical Analysis Studies of Block Copolymers of Styrene and Dimethylsiloxane

Xin Chen; Joseph A. Gardella; Philip L. Kumler

doi:10.1021/ma00050a035

Fourier-Transform Infrared and Electron Spectroscopy for Chemical Analysis Studies of Block Copolymers of Styrene and Dimethylsiloxane

Xin Chen
, Joseph A. Gardella
, Philip L. Kumler

Chemistry

SUNY Buffalo
State University of New York at Fredonia

Research output: Contribution to journal › Article › peer-review

61 Scopus citations

Abstract

The surface segregation of poly(dimethylsiloxane) (PDMS) in chloroform solution cast films of styrene and dimethylsiloxane block copolymers in AB diblock and ABA and BAB triblock types was investigated by electron spectroscopy for chemical analysis and attenuated total reflectance (ATR) FTIR. The results show that the PDMS surface segregation is mainly dependent on the architectures of the block copolymers and the PDMS block length. AB-type diblock copolymers exhibit a relatively thicker pure PDMS surface layer, and the PDMS surface segregation effects were detected up to the ATR-FTIR sampling depth. All three types of block copolymers present much higher PDMS concentrations in the outermost surface region (about 0-27 Å from the air interface) than in the bulk materials. PDMS surface segregation changes were observed for some of the block copolymers after annealing the as-cast films.

Original language	English
Pages (from-to)	6621-6630
Number of pages	10
Journal	Macromolecules
Volume	25
Issue number	24
DOIs	https://doi.org/10.1021/ma00050a035
State	Published - Nov 1 1992

Access to Document

10.1021/ma00050a035

Cite this

@article{b0d21fc64a664ed3b79d70a3663fc54a,

title = "Fourier-Transform Infrared and Electron Spectroscopy for Chemical Analysis Studies of Block Copolymers of Styrene and Dimethylsiloxane",

abstract = "The surface segregation of poly(dimethylsiloxane) (PDMS) in chloroform solution cast films of styrene and dimethylsiloxane block copolymers in AB diblock and ABA and BAB triblock types was investigated by electron spectroscopy for chemical analysis and attenuated total reflectance (ATR) FTIR. The results show that the PDMS surface segregation is mainly dependent on the architectures of the block copolymers and the PDMS block length. AB-type diblock copolymers exhibit a relatively thicker pure PDMS surface layer, and the PDMS surface segregation effects were detected up to the ATR-FTIR sampling depth. All three types of block copolymers present much higher PDMS concentrations in the outermost surface region (about 0-27 {\AA} from the air interface) than in the bulk materials. PDMS surface segregation changes were observed for some of the block copolymers after annealing the as-cast films.",

author = "Xin Chen and Gardella, \{Joseph A.\} and Kumler, \{Philip L.\}",

year = "1992",

month = nov,

day = "1",

doi = "10.1021/ma00050a035",

language = "English",

volume = "25",

pages = "6621--6630",

journal = "Macromolecules",

issn = "0024-9297",

publisher = "American Chemical Society",

number = "24",

}

TY - JOUR

T1 - Fourier-Transform Infrared and Electron Spectroscopy for Chemical Analysis Studies of Block Copolymers of Styrene and Dimethylsiloxane

AU - Chen, Xin

AU - Gardella, Joseph A.

AU - Kumler, Philip L.

PY - 1992/11/1

Y1 - 1992/11/1

N2 - The surface segregation of poly(dimethylsiloxane) (PDMS) in chloroform solution cast films of styrene and dimethylsiloxane block copolymers in AB diblock and ABA and BAB triblock types was investigated by electron spectroscopy for chemical analysis and attenuated total reflectance (ATR) FTIR. The results show that the PDMS surface segregation is mainly dependent on the architectures of the block copolymers and the PDMS block length. AB-type diblock copolymers exhibit a relatively thicker pure PDMS surface layer, and the PDMS surface segregation effects were detected up to the ATR-FTIR sampling depth. All three types of block copolymers present much higher PDMS concentrations in the outermost surface region (about 0-27 Å from the air interface) than in the bulk materials. PDMS surface segregation changes were observed for some of the block copolymers after annealing the as-cast films.

AB - The surface segregation of poly(dimethylsiloxane) (PDMS) in chloroform solution cast films of styrene and dimethylsiloxane block copolymers in AB diblock and ABA and BAB triblock types was investigated by electron spectroscopy for chemical analysis and attenuated total reflectance (ATR) FTIR. The results show that the PDMS surface segregation is mainly dependent on the architectures of the block copolymers and the PDMS block length. AB-type diblock copolymers exhibit a relatively thicker pure PDMS surface layer, and the PDMS surface segregation effects were detected up to the ATR-FTIR sampling depth. All three types of block copolymers present much higher PDMS concentrations in the outermost surface region (about 0-27 Å from the air interface) than in the bulk materials. PDMS surface segregation changes were observed for some of the block copolymers after annealing the as-cast films.

UR - https://www.scopus.com/pages/publications/0026953269

U2 - 10.1021/ma00050a035

DO - 10.1021/ma00050a035

M3 - Article

AN - SCOPUS:0026953269

SN - 0024-9297

VL - 25

SP - 6621

EP - 6630

JO - Macromolecules

JF - Macromolecules

IS - 24

ER -

Fourier-Transform Infrared and Electron Spectroscopy for Chemical Analysis Studies of Block Copolymers of Styrene and Dimethylsiloxane

Abstract

Access to Document

Other files and links

Fingerprint

Cite this