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Field evaporation mechanism of bulk oxides under ultra fast laser illumination

  • Université et INSA de Rouen-UMR CNRS 6634-Normandie Université

Research output: Contribution to journalArticlepeer-review

59 Scopus citations

Abstract

The controlled field evaporation of single atoms from an oxide surface assisted by ultra fast laser pulses has recently been demonstrated. When UV light is used, a photoionization mechanism was proposed. However, experimental results observed when the laser intensity and wavelength are changed cannot be explained by this mechanism. Instead, a thermal assisted evaporation mechanism characterized by two evaporation times is proposed. The fast and slow evaporation rates are associated to two cooling processes inside the tip sample. Experiments are carried out on TiO2 and MgO field emitter tips to check the dependence of the evaporation process on structural properties of the oxide. A good agreement between the predictions of our model and the experimental data is found.

Original languageEnglish
Article number044321
JournalJournal of Applied Physics
Volume110
Issue number4
DOIs
StatePublished - Aug 15 2011

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