Abstract
A theoretical investigation and new experiments on the conductivity of lightly doped p-Si (boron) at 77 K are presented. The conductivity is studied as a function of the electric field in the range 10<E<104 V/cm. The experimental results are interpreted within an original Monto Carlo simulation which includes the mechanism of generation and recombination from impurity centers, thus allowing a simultaneous calculation of the mobility and the fraction of ionized impurities. The good agreement between the theory and the experiments supports the reliability of the physical model suggested.
| Original language | English |
|---|---|
| Pages (from-to) | 5404-5408 |
| Number of pages | 5 |
| Journal | Journal of Applied Physics |
| Volume | 66 |
| Issue number | 11 |
| DOIs | |
| State | Published - 1989 |
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