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Epitaxial VO2 thin-film-based radio-frequency switches with electrical activation Jaeseong Lee1

  • Daesu Lee
  • , Sang June Cho
  • , Jung Hun Seo
  • , Dong Liu
  • , Chang Beom Eom
  • , Zhenqiang Ma
  • University of Wisconsin-Madison

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

Vanadium dioxide (VO2) is a correlated material exhibiting a sharp insulator-to-metal phase transition (IMT) caused by temperature change and/or bias voltage. We report on the demonstration of electrically triggered radio-frequency (RF) switches based on epitaxial VO2 thin films. The highly epitaxial VO2 and SnO2 template layer was grown on a (001) TiO2 substrate by pulsed laser deposition (PLD). A resistance change of the VO2 thin films of four orders of magnitude was achieved with a relatively low threshold voltage, as low as 13V, for an IMT phase transition. VO2 RF switches also showed high-frequency responses of insertion losses of %3 dB at the on-state and return losses of %4.3 dB at the off-state over 27GHz. Furthermore, an intrinsic cutoff frequency of 17.4 THz was estimated for the RF switches. The study on electrical IMT dynamics revealed a phase transition time of 840 ns.

Original languageEnglish
Article number091101
JournalApplied Physics Express
Volume10
Issue number9
DOIs
StatePublished - Sep 2017

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