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Epitaxial thin films of topological insulator Bi 2Te 3 with two-dimensional weak anti-localization effect grown by pulsed laser deposition

  • S. X. Zhang
  • , L. Yan
  • , J. Qi
  • , M. Zhuo
  • , Y. Q. Wang
  • , R. P. Prasankumar
  • , Q. X. Jia
  • , S. T. Picraux
  • Los Alamos National Laboratory
  • Los Alamos National Laboratory Materials Science and Technology Division

Research output: Contribution to journalArticlepeer-review

48 Scopus citations

Abstract

We have grown high quality epitaxial topological insulator Bi 2Te 3 thin films on silicon (111) substrates by pulsed laser deposition. Systematic structural characterization of the films using X-ray diffraction and transmission electron microscopy has demonstrated that a low laser pulse rate is the key to achieving epitaxial films. The films show n-type metallic behavior, consistent with Te deficiency as determined by Rutherford backscattering spectrometry measurements. The A 1g longitudinal optical phonon mode of Bi 2Te 3 was detected by time-resolved reflectivity measurements. A 2-dimensional (2-D) weak-antilocalization effect was also observed at low temperatures, which indicates the existence of topologically protected 2-D surface states in our thin films. This growth and characterization effort paves the way to fabricate multi-layer heterostructures of topological insulators along with ferromagnetic oxides and high temperature superconductors by the same growth technique in the search for physics arising from their interfacial couplings.

Original languageEnglish
Pages (from-to)6459-6462
Number of pages4
JournalThin Solid Films
Volume520
Issue number21
DOIs
StatePublished - Aug 31 2012

Keywords

  • Bismuth telluride
  • Epitaxial thin films
  • Pulsed laser deposition
  • Topological insulators
  • Weak anti-localization effect

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