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Epitaxial growth and metal-insulator transition of vanadium oxide thin films with controllable phases

  • Y. D. Ji
  • , T. S. Pan
  • , Z. Bi
  • , W. Z. Liang
  • , Y. Zhang
  • , H. Z. Zeng
  • , Q. Y. Wen
  • , H. W. Zhang
  • , C. L. Chen
  • , Q. X. Jia
  • , Y. Lin
  • University of Electronic Science and Technology of China
  • Los Alamos National Laboratory
  • University of Texas at San Antonio
  • University of Houston

Research output: Contribution to journalArticlepeer-review

66 Scopus citations

Abstract

Vanadium oxide thin films with well controlled phases such as rhombohedra V 2O 3 and monoclinic VO 2 were synthesized on Al 2O 3 (0001) substrates by optimizing the processing parameters of a polymer assisted deposition technique. X-ray diffraction and high-resolution transmission electron microscopy studies revealed that both V 2O 3 and VO 2 films can be well controlled with good epitaxial quality. The temperature dependency of electrical resistivity demonstrated sharp metal-insulator transitions (MITs) for V 2O 3 and VO 2 films. The crystallinity and the strains in the films are believed to play critical roles in determining the MIT properties.

Original languageEnglish
Article number071902
JournalApplied Physics Letters
Volume101
Issue number7
DOIs
StatePublished - Aug 13 2012

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