Skip to main navigation Skip to search Skip to main content

Enhancement-mode N-polar GaN metal-insulator-semiconductor field effect transistors with current gain cutoff frequency of 120GHz

  • Uttam Singisetti
  • , Man Hoi Wong
  • , Sansaptak Dasgupta
  • , James S. Speck
  • , Umesh K. Mishra
  • University of California at Santa Barbara

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

We report the small-signal high-frequency performance of novel enhancement-mode N-polar GaN metal-insulator-semiconductor field effect transistors with a peak short-circuit current gain cutoff frequency (ft) of 120 GHz for a 70-nm gate length device. The device has an 8-nm GaN channel with AlN back barrier and a 5-nm SiNx gate dielectric. These devices show a peak drain current of 0.74A/mm and peak transconductance of 260mS/mm at a drain bias of 3.0 V. This is the first demonstration of high-frequency operation of N-polar enhancementmode GaN devices.

Original languageEnglish
Article number24103
JournalApplied Physics Express
Volume4
Issue number2
DOIs
StatePublished - Feb 2011

Fingerprint

Dive into the research topics of 'Enhancement-mode N-polar GaN metal-insulator-semiconductor field effect transistors with current gain cutoff frequency of 120GHz'. Together they form a unique fingerprint.

Cite this