Abstract
We present a detailed study on the tradeoffs in emitter-base profile optimization for a 120GHz SiGe HBT. The influence of two key process variables on the HBT electrical characteristics were investigated. Results indicate that careful optimization of the emitter-base profile will be required to achieve critical HBT performance parameters. The impact of these process variables to the low frequency noise characteristics have been compared as well. 1/f noise reduction can be achieved by optimizing the emitter doping concentration.
| Original language | English |
|---|---|
| Pages | 45-51 |
| Number of pages | 7 |
| State | Published - 2004 |
| Event | SiGe: Materials, Processing, and Devices - Proceedings of the First Symposium - Honolulu, HI, United States Duration: Oct 3 2004 → Oct 8 2004 |
Conference
| Conference | SiGe: Materials, Processing, and Devices - Proceedings of the First Symposium |
|---|---|
| Country/Territory | United States |
| City | Honolulu, HI |
| Period | 10/3/04 → 10/8/04 |
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